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Updated: Feb 19, 2026

Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
Takashi Yatsui1, Hiroshi Saito1, Katsuyuki Nobusada2
1School of Engineering, University of Tokyo, Bunkyo-ku, Tokyo, 113-8656 Japan.
A novel near-field etching technique achieves angstrom-scale surface flattening by using optical near-fields (ONFs) to selectively remove nanoscale protrusions. This method enhances device performance by minimizing carrier scattering.
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