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Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett-Burman design and
Prachi Chaudhary1, Vinod Chhokar2, Pragati Choudhary2
1Department of Biotechnology, Maharishi Markandeshwar University, Mullana, Ambala, 133207, India.
Abstract:
A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectively. Optimization of physiochemical parameters for biosorption of chromium and tannic acid degradation was carried out by Plackett-Burman design followed by response surface methodology (RSM). The maximum chromium removal and tannic acid degradation was found to be 92 and 68% respectively by A. niveus. Chromium removal and tannic acid degradation was increased up to 11 and 6% respectively after optimization. Scanning electron microscopy (SEM) and Fourier transform infrared spectroscopy (FTIR) was used to investigate biosorption phenomena.
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