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Experimental Methods of Dust Charging and Mobilization on Surfaces with Exposure to Ultraviolet Radiation or Plasmas
Published on: April 3, 2018
1Department of Chemical and Nuclear Engineering, The University of New Mexico, Albuquerque, NM 87131.
Semiconductor processing plasmas contain dust particles that threaten device yield. New research shows these dust particles, when confined, exhibit charge density wave motion, offering insights into plasma behavior.
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