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All-electronic Nanosecond-resolved Scanning Tunneling Microscopy: Facilitating the Investigation of Single Dopant Charge Dynamics
Published on: January 19, 2018
Random dopant fluctuations and statistical variability in n-channel junctionless FETs
N D Akhavan1, G A Umana-Membreno1, R Gu1
1School of Electrical, Electronic and Computer Engineering, The University of Western Australia, Perth, 6009, WA, Australia.
Random dopant fluctuations impact silicon junctionless nanowire transistor (JNT) electrical variability. Optimizing doping density in JNTs achieves near-ideal performance, enabling continued scaling in silicon CMOS technology.
Area of Science:
- Semiconductor device physics
- Quantum transport simulations
- Advanced materials science
Background:
- Random dopant fluctuations (RDF) significantly impact nanoscale transistor variability.
- Silicon junctionless nanowire transistors (JNTs) are promising for future integrated circuits.
- Understanding RDF effects is crucial for reliable device performance and scaling.
Purpose of the Study:
- To investigate the influence of random dopant fluctuations on the statistical variability of n-channel JNT electrical characteristics.
- To explore the impact of varying doping densities and gate lengths on JNT performance.
- To identify optimal doping strategies for minimizing variability in JNTs.
Main Methods:
- Three-dimensional quantum simulations utilizing the non-equilibrium Green's function (NEGF) formalism.
- Atomistic modeling of JNTs with gate lengths of 5, 10, and 15 nm.
- Simulation of average doping densities at 2 × 10^19, 6 × 10^19, and 1 × 10^20 cm^-3.
Main Results:
- Demonstrated a direct correlation between doping density and statistical variability in JNT electrical properties.
- Showcased that specific doping density adjustments can significantly reduce device-to-device variations.
- Identified optimal doping ranges for achieving high performance and low variability across different gate lengths.
Conclusions:
- Proper adjustment of doping density in JNTs is critical for mitigating random dopant fluctuation effects.
- Achieving near-ideal statistical variability and electrical performance is possible through optimized doping.
- This research provides a pathway for the continued scaling of silicon CMOS technology by improving JNT reliability.
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