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Updated: Feb 18, 2026

Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
Highly Efficient Thin-Film Transistor via Cross-Linking of 1T Edge Functional 2H Molybdenum Disulfides
Hanleem Lee1, Sora Bak1, Sung-Jin An1
1Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS), ‡Department of Chemistry, and §Department of Energy Science, Sungkyunkwan University , Suwon 16419, Korea.
Abstract:
Thin-film transistors (TFTs) have received great attention for their use in lightweight, large area, and wearable devices. However, low crystalline materials and inhomogeneous film formation limit the realization of high-quality electrical properties for channels in commercial TFTs, especially for flexible electronics. Here, we report a field-effect TFT fabricated via cross-linking of edge-1T basal-2H MoS2 sheets that are prepared by edge functional exfoliation of bulk MoS2 with soft organic exfoliation reagents. For edge functional exfoliation, the electrophilic 4-carboxy-benzenediazonium used as the soft organic reagent attacks the nucleophilic thiolates exposed at the edge of the bulk MoS2 with the help of an amine catalyst, resulting in 1T edge-functional HOOC-benzene-2H basal MoS2 nanosheets (e-MoS2). The cross-linking via hydrogen bonding of the negatively charged HOOC of the e-MoS2 sheets with the help of a cationic polymer, polydiallyldimethylammonium chloride, results in a good film formation for a channel of the solution processing TFT. The TFT exhibits an extremely high mobility of 170 cm2/(V s) at 1 V (on/off ratio of 106) on SiO2/Si substrate and also a high mobility of 36.34 cm2/(V s) (on/off ratio of 103) on PDMS/PET substrate.

