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Modular injector integrated linear apparatus with motion profile optimization for spatial atomic layer deposition.

Xiaolei Wang1, Yun Li1, Jilong Lin1

  • 1State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, 1037 Luoyu Road, Wuhan, Hubei 430074, People's Republic of China.

The Review of Scientific Instruments
|December 3, 2017
PubMed
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This summary is machine-generated.

A new spatial atomic layer deposition apparatus improves film quality by using an S-curve motion profile. This reduces vibrations and stabilizes the gap between the injector and substrate for uniform, high-rate deposition.

Area of Science:

  • Materials Science
  • Chemical Engineering
  • Nanotechnology

Background:

  • Spatial atomic layer deposition (SALD) enables large-area, high-throughput thin-film fabrication.
  • High-speed substrate movement in SALD can induce vibrations, degrading film uniformity and quality.
  • Controlling the gap between the injector and substrate is critical for consistent deposition.

Purpose of the Study:

  • To design and evaluate a novel spatial atomic layer deposition apparatus with enhanced motion control.
  • To investigate the impact of motion profiles on vibration reduction and deposition uniformity.
  • To achieve high deposition rates with improved film microstructure.

Main Methods:

  • Design of a SALD apparatus featuring a modular injector with multi-layer channels and a linear motor drive.

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  • Implementation of an S-curve motion profile to mitigate inertial impacts during substrate translation.
  • Analysis of residual vibration, gap distance fluctuation, and film microstructure using atomic force microscopy (AFM).

    • Main Results:

    • The S-curve motion profile reduced maximum position error by 84%.
    • AFM analysis revealed smaller root-mean-square and scanning voltage amplitudes, indicating reduced vibration.
    • Stable gap distance and uniform film deposition with a rate of 100 nm/min were achieved without periodic patterns.

    Conclusions:

    • The designed SALD apparatus effectively minimizes vibrations through an S-curve motion profile.
    • Optimized motion control significantly enhances film deposition quality and uniformity.
    • The developed system demonstrates potential for high-throughput, large-area thin-film manufacturing.