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Signal processing and analysis for copper layer thickness measurement within a large variation range in the CMP

Hongkai Li1, Qian Zhao1, Xinchun Lu1

  • 1State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing, China.

The Review of Scientific Instruments
|December 3, 2017
PubMed
Summary

This study introduces an in situ eddy current system for measuring copper (Cu) layer thickness during chemical mechanical planarization (CMP). The system accurately tracks thickness variations, enabling precise endpoint detection in Cu CMP processes.

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Area of Science:

  • Materials Science
  • Semiconductor Manufacturing
  • Metrology

Background:

  • Accurate endpoint detection is crucial for copper (Cu) chemical mechanical planarization (CMP) to ensure wafer quality.
  • Eddy current technology offers a feasible method for in situ measurement of metal layer thickness.

Purpose of the Study:

  • To develop and apply an independently developed in situ measurement system using eddy current technology for the actual Cu CMP process.
  • To analyze the dynamic response characteristics of the output signal under different Cu layer thickness variations.

Main Methods:

  • An in situ measurement system based on eddy current technology was independently developed.
  • Experiments were conducted to analyze the dynamic response of the output signal.
  • A data processing algorithm was employed to extract voltage difference variations, representing Cu layer thickness.

Main Results:

  • The voltage difference of the output signal correlates negatively with Cu layer thickness in the conventional range, with increased sensitivity as thickness decreases.
  • A thickness threshold was identified, beyond which the correlation becomes negative.
  • The system's applicability across a wider Cu layer thickness range is possible with two calibration tables.

Conclusions:

  • The developed in situ eddy current system provides a viable method for monitoring Cu layer thickness during CMP.
  • The system demonstrates potential for precise endpoint detection by analyzing signal variations.
  • Calibration strategies can extend the operational range of the eddy current system for Cu CMP applications.