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Updated: Feb 17, 2026

Building Langmuir Probes and Emissive Probes for Plasma Potential Measurements in Low Pressure, Low Temperature Plasmas
Published on: May 25, 2021
Automatic emissive probe apparatus for efficient plasma potential measurements
Jian-Quan Li1, Wen-Qi Lu1, Jun Xu1
1Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Ministry of Education, Dalian 116024, People's Republic of China.
Abstract:
The improved inflection point method of emissive probe is the most accurate method for plasma potential measurements, but its manual operation is quite cumbersome and time-consuming. This paper describes the design and test of an automatic emissive probe apparatus for efficient plasma potential measurements. The apparatus consists of a computer controlled data acquisition (DAQ) card, a working circuit composed of a biasing unit and a heating unit, as well as the emissive probe. The main feature of the apparatus is that both the biasing scan and the heating scan of the probe are controlled by the computer program through analog outputs of the DAQ card, which easily realizes the required timing between the biasing and heating scans of the probe. The apparatus can automatically execute the improved inflection point method of emissive probe and give the plasma potential result. The advantages of high-accuracy, high-efficiency, and durability of probe filament make the apparatus promising for extensive use in plasma potential measurements.
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