Updated: Feb 16, 2026

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
Published on: September 28, 2019
S Catalano1, M Gibert1, J Fowlie1
1DQMP, Université de Genève, 24 Quai Ernest-Ansermet, 1211 Geneva, Switzerland.
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This review explores rare-earth nickelate heterostructures (RNiO3), focusing on how strain and confinement control their unique physical properties. These functional materials offer promising applications in future electronic devices.
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