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Characterization of Thermal Transport in One-dimensional Solid Materials
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Thin film absorption characterization by focus error thermal lensing.

Esteban A Domené1, Drew Schiltz2, Dinesh Patel2

  • 1Laboratorio de Fotónica, Departamento de Física, Facultad de Ingeniería, UBA, Paseo Colón Av. Paseo Colón 850, C1063ACV Buenos Aires, Argentina.

The Review of Scientific Instruments
|January 1, 2018
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Summary
This summary is machine-generated.

A novel thermal lensing technique offers highly sensitive measurement of absorbed power in thin dielectric films. This method accurately quantifies absorption loss, even for moving targets, with exceptional dynamic range and precision.

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Area of Science:

  • Materials Science
  • Optical Physics
  • Metrology

Background:

  • Accurate measurement of optical absorption in thin films is crucial for device performance.
  • Existing techniques may lack sensitivity or be unsuitable for dynamic measurements.

Purpose of the Study:

  • To demonstrate a simple, highly sensitive technique for measuring absorbed power in thin film dielectrics.
  • To establish a method for characterizing absorption loss with high dynamic range and precision.

Main Methods:

  • Utilizes thermal lensing induced by an amplitude-modulated or pulsed pump beam.
  • Employs a continuous wave probe beam and a four-quadrant detector with cylindrical lenses to generate a focus error signal.
  • Quantifies absorbed power by measuring changes in the probe beam profile.

Main Results:

  • Demonstrates a linear dependence of the focus error signal on absorbed power over a dynamic range exceeding 10^5.
  • Achieves a single-shot sensitivity of approximately 20 ppm in pulsed configuration.
  • Successfully measures absorption loss in dielectric thin films on fused silica substrates.

Conclusions:

  • The demonstrated thermal lensing technique provides a sensitive and robust method for measuring absorbed power in thin films.
  • The technique's high sensitivity and dynamic range make it suitable for characterizing thin films, including in situ measurements of moving targets.
  • This approach offers a valuable tool for materials characterization and quality control in thin film applications.