Photo-Reconfigurable Azopolymer Etch Mask: Photofluidization-Driven Reconfiguration and Edge Rectangularization

Area of Science:

• Materials Science
• Nanotechnology
• Photochemistry

Background:

• Azobenzene materials enable structural reconfiguration via photofluidization.
• Current methods result in rounded walls, limiting applications in lithography.
• Reconfigurable etch masks are crucial for flexible micro/nanofabrication.

Purpose of the Study:

• To develop a method for transforming rounded walls in azopolymer architectures into rectangular ones.
• To enable the creation of photo-reconfigurable etch masks with improved structural fidelity.
• To enhance the flexibility and applicability of azopolymer-based lithography.

Main Methods:

• Developed a 'rectangularization' process involving far-field light irradiation.
• Utilized conformal contact with a polydimethylsiloxane (PDMS) film during photofluidization.
• Achieved controlled structural transformation of azopolymer architectures.

Main Results:

• Successfully converted round walls of azopolymer structures into rectangular ones.
• Created diverse micro/nanoarchitectures with rectangular walls, ranging from micrometers down to 150 nm.
• Demonstrated the formation of a photo-reconfigurable etch mask with high structural fidelity.

Conclusions:

• Rectangularization overcomes limitations of previous photofluidization methods.
• The developed technique provides a versatile platform for advanced lithography.
• This method significantly enhances the utility of azobenzene materials in micro/nanofabrication.