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Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Weijia Han1, Peilong Hou1, Shamaila Sadaf1
1Institut für Chemie neuer Materialien, Universität Osnabrück , Barbarastr. 7, 49076 Osnabrück, Germany.
High-throughput production of ordered, topographically patterned silicon (tpSi) is achieved using insect-inspired capillary stamping and metal-assisted chemical etching (MACE). This novel method creates patterns for potential use in silicon-based identity labels and quick response codes.
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