Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam

S Gurbán1, P Petrik1, M Serényi1

  • 1Institute for Technical Physics and Materials Science, Centre for Energy Research Hungarian Academy of Sciences, P.O.B. 49, H-1525, Budapest, Hungary.

Scientific Reports
|February 3, 2018
PubMed

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