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Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
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Atomic layer deposition and properties of ZrO2/Fe2O3 thin films

Kristjan Kalam1, Helina Seemen1, Peeter Ritslaid1

  • 1Institute of Physics, University of Tartu, W. Ostwald 1, 50411 Tartu, Estonia.

Beilstein Journal of Nanotechnology
|February 15, 2018
PubMed

Keywords:
atomic layer depositionmetal oxidesthin films

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