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Atomic layer deposited high-k dielectric on graphene by functionalization through atmospheric plasma treatment

Jeong Woo Shin1, Myung Hoon Kang2, Seongkook Oh1

  • 1Department of Manufacturing Systems and Design Engineering (MSDE), Seoul National University of Science and Technology (SeoulTech), Seoul 01811, Republic of Korea.

Nanotechnology
|February 21, 2018
PubMed

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