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The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Jaemok Koo1, Jeehye Yang1, Boeun Cho1
1Department of Chemical Engineering , Soongsil University , Seoul 156-743 , Korea.
This study introduces novel nonvolatile transistor memory using electric double-layer (EDL) effects and gold nanoparticles for charge storage. These devices offer high performance and long retention, paving the way for portable electronics.
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