Field Effect Transistor
Curing of Concrete
Curing Methods
High-Performance Liquid Chromatography: Elution Process
Accelerated Curing of Concrete
Oxidation Numbers
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Updated: Feb 13, 2026

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Suresh Kumar Garlapati1, Gabriel Cadilha Marques2, Julia Susanne Gebauer3
1Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), D-76344 Eggenstein-Leopoldshafen, Germany.
Photonic curing enables rapid, low-temperature fabrication of high-performance Indium Oxide (In2O3) field-effect transistors (FETs). Different photonic methods allow tuning of threshold voltage, enabling both depletion and enhancement modes for unipolar circuits.
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