Deterministic Integration of Quantum Dots into on-Chip Multimode Interference Beamsplitters Using in Situ Electron...

Area of Science:

• Quantum Optics
• Nanophotonics
• Quantum Information Science

Background:

• Advancements in quantum optical circuits require integrating quantum emitters, gates, and detectors on a single chip for scalable quantum networks.
• Deterministic fabrication techniques are crucial for precisely placing preselected quantum emitters into nanophotonic elements.

Purpose of the Study:

• To present a method for the deterministic integration of a preselected quantum emitter into a nanophotonic circuit element.
• To demonstrate the functionality of the integrated quantum emitter-beamsplitter interface.

Main Methods:

• Utilized in situ electron beam lithography for precise integration of an Indium Arsenide (InAs) quantum dot into a 50/50 multimode interference (MMI) beamsplitter.
• Measured triggered single-photon emission on-chip to verify the functionality of the quantum emitter-gate interface.

Main Results:

• Successfully demonstrated the deterministic integration of an InAs quantum dot into an MMI beamsplitter.
• Achieved triggered single-photon emission with a second-order correlation function g(2)(0) = 0.13 ± 0.02, confirming quantum light source functionality.
• Showcased the high resolution and control offered by in situ electron beam lithography for complex photonic systems.

Conclusions:

• In situ electron beam lithography provides a scalable, single-step approach for integrating preselected quantum emitters into nanophotonic circuits.
• This technique is a key enabler for the development of multinode, fully integrated quantum photonic chips.
• The demonstrated interface paves the way for advanced on-chip quantum optical systems.