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Updated: Feb 12, 2026

Plasma-Assisted Molecular Beam Epitaxy Growth of Mg3N2 and Zn3N2 Thin Films
Published on: May 11, 2019
Development of a hybrid molecular beam epitaxy deposition system for in situ surface x-ray studies
Tassie K Andersen1, Seyoung Cook1, Erika Benda2
1Materials Science Division, Argonne National Laboratory, 9700 S. Cass Ave., Argonne, Illinois 60439, USA.
Abstract:
A portable metalorganic gas delivery system designed and constructed to interface with an existing molecular beam epitaxy chamber at beamline 33-ID-E of the Advanced Photon Source is described. This system offers the ability to perform in situ X-ray measurements of complex oxide growth via hybrid molecular beam epitaxy. The performance of the hybrid molecular beam epitaxy system while delivering metalorganic source materials is described. The high-energy X-ray scattering capabilities of the hybrid molecular beam epitaxy system are demonstrated both on oxide films grown solely from the metalorganic source and ABO3 oxide perovskites containing elements from both the metalorganic source and a traditional effusion cell.
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