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Novel high-frequency energy-efficient pulsed-dc generator for capacitively coupled plasma discharge
Md Abdullah Al Mamun1, Hiroshi Furuta1, Akimitsu Hatta1
1Graduate School of Engineering, Kochi University of Technology, Kami, Kochi 782-8502, Japan.
The Review of Scientific Instruments
|April 2, 2018
Summary
A novel high-voltage pulsed DC generator (PDG) achieves fast, rectangular pulses for capacitively coupled plasma (CCP) discharge. This efficient PDG enhances plasma processing capabilities.
Area of Science:
- Plasma Physics
- Electrical Engineering
- Materials Science
Background:
- Capacitively coupled plasma (CCP) discharges require precise high-voltage pulsed DC power.
- Generating sharp, rectangular pulses with fast edges for capacitive loads is challenging due to high current demands.
- Existing systems often face limitations in pulse operation frequency.
Purpose of the Study:
- To design, assemble, and test a new high-frequency, high-voltage pulsed DC generator (PDG).
- To achieve almost rectangular high-voltage pulses with fast rising and falling edges for CCP discharge.
- To ensure stable plasma current control during pulsed operation.
Main Methods:
- Development of a PDG utilizing half-resonant converters and a constant current-controller circuit.
- Integration of high-voltage solid-state power switches for pulse generation.
- Modulation from a high-voltage DC input to a pulsed DC output, controlled by input signals and current levels.
Main Results:
- The PDG successfully generated pulses with rise/fall times <500 ns / <800 ns and minimum width of 1 µs.
- Achieved a maximum negative pulse voltage of 1000 V and a maximum repetition frequency of 500 kHz.
- Demonstrated stable plasma discharge current control and 85% energy efficiency at 1 kHz repetition rate.
Conclusions:
- The developed PDG effectively produces high-quality pulses suitable for CCP discharge.
- The half-resonant converters enable efficient energy recovery from capacitive loads.
- The PDG offers a more efficient solution for plasma processing applications using CCP.
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