Augmenting mask-based lithography with direct laser writing to increase resolution and speed

Area of Science:

• Microfabrication
• Photolithography
• Nanotechnology

Background:

• Conventional photolithography often requires expensive masks and can be limited in resolution.
• Direct laser writing offers flexibility but can be slow and costly for large-area patterning.

Purpose of the Study:

• To introduce a hybrid photolithography method, Laser Augmented Microlithographic Patterning (LAMP).
• To combine the advantages of mask-based lithography and direct laser writing for enhanced microfabrication.
• To demonstrate the capability of LAMP for creating high-resolution microstructures and functional devices.

Main Methods:

• Developed and demonstrated the Laser Augmented Microlithographic Patterning (LAMP) technique.
• Utilized direct laser writing to define features in conjunction with a transparency mask.
• Tested LAMP with both positive-tone (S1813) and negative-tone (SU-8) photoresists.

Main Results:

• Achieved registration of laser-written features to within 2.2 µm of mask-defined features.
• Demonstrated sub-micron linewidth capabilities for laser-written features.
• Fabricated example structures including an interdigitated electrode and a microfluidic device for cell/bead capture.

Conclusions:

• LAMP effectively compensates for the limitations of individual lithography techniques.
• The hybrid approach enables rapid creation, testing, and modification of high-resolution micro-prototypes.
• LAMP offers a versatile platform for advanced microfluidic and electronic device fabrication.