In-plane stress development in mesoporous thin films

P Cop1, S Kitano, K Niinuma

  • 1Physikalisch-Chemisches Institut, Justus-Liebig-Universität, Heinrich-Buff-Ring 17, 35392 Giessen, Germany. smarsly@uni-giessen.de.

Nanoscale
|April 4, 2018
PubMed
Summary

This study explores how mesoporous structures influence mechanical stress in thin films made of TiO2 and CexZr1-xO2. Researchers used a self-assembly process to create ordered mesopores and then measured how stress changed during heating and after cooling. They found that films with templated mesopores had lower stress than non-templated ones. The study also showed that when pores collapse during heating, residual stress increases. These results suggest that mesoporous structures can act as stress-relaxing agents, which could help in designing more stable thin films for various applications.

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