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Updated: Feb 12, 2026

Correlative Light- and Electron Microscopy Using Quantum Dot Nanoparticles
Published on: August 7, 2016
Visualizing a core-shell structure of heavily doped silicon quantum dots by electron microscopy using an atomically
Hiroshi Sugimoto1, Masataka Yamamura, Makoto Sakiyama
1Department of Electrical and Electronic Engineering, Graduate School of Engineering, Kobe University, Rokkodai, Nada, Kobe 657-8501, Japan. sugimoto@eedept.kobe-u.ac.jp.
We visualized the core-shell structure of boron and phosphorus codoped silicon quantum dots (Si QDs). The study revealed a crystalline Si core and an amorphous shell containing Si, B, and P.
Area of Science:
- Materials Science
- Nanotechnology
- Solid State Physics
Background:
- Silicon quantum dots (Si QDs) are crucial in nanoelectronics and optoelectronics.
- Understanding the structure of doped Si QDs is essential for tuning their properties.
- Boron (B) and Phosphorus (P) doping can significantly alter Si QD characteristics.
Purpose of the Study:
- To visualize and characterize the core-shell structure of heavily B and P codoped Si QDs.
- To investigate the distribution of dopants within the Si QD structure.
- To establish a method for high-resolution imaging of doped nanomaterials.
Main Methods:
- Transmission electron microscopy (TEM) was employed for high-resolution imaging.
- An ultra-thin graphene oxide (GO) support film was utilized to minimize sample interference.
- Enhanced contrast imaging techniques were applied to reveal structural details.
Main Results:
- The core-shell structure of the codoped Si QD was successfully visualized.
- A highly crystalline silicon (Si) core was identified.
- An amorphous shell composed of Si, B, and P was observed surrounding the core.
Conclusions:
- The study provides direct visualization of the unique core-shell structure in B and P codoped Si QDs.
- The findings confirm the formation of an amorphous, multi-elemental shell around a crystalline Si core.
- This structural understanding is vital for the development of advanced Si QD-based devices.
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