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Updated: Feb 11, 2026

Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
High Efficiency Light-Emitting Transistor with Vertical Metal-Oxide Heterostructure
Xiang Liu1,2, Wenjian Kuang2, Haibin Ni2
1Division of Nanophotonics, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 10010, China.
Abstract:
The monolithic integration of light-emission with a standard logic transistor is a much-desired multifunctionality. Here, a high-efficiency light-emitting transistor (LET) employing an inorganic quantum dots (QDs) emitter and a laser-annealed vertical metal-oxide heterostructure is reported. The experimental results show that the peak efficiency and luminance of this QDs LET (QLET) are 11% and 8000 cdm-2 , respectively at a monochromatic emitting light wavelength of 585 nm. As far as it is known, these are among the highest values ever achieved for LETs. More importantly, the QLET exhibits an ultrahigh electron mobility of up to 25 cm2 V-1 S-1 , a lower efficiency roll-off (7% at high 3000 cdm-2 ), and excellent stability with long-duration gate stress switching cycles. Additionally, this approach is compatible with those used in conventional large-area silicon electronic manufacturing and can enable a scalable and cost-effective procedure for future integrated versatile displays and lighting applications.
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