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    This study introduces a novel 1D stitching interferometry method using angular measurements for precise mirror metrology. This technique significantly improves nanometer-level surface profiling accuracy and reliability compared to traditional methods.

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    Area of Science:

    • Optical metrology
    • Surface characterization
    • Precision engineering

    Background:

    • High-precision mirror metrology is crucial for advanced optical systems.
    • Traditional stitching interferometry methods can be limited by stage motion errors.
    • Accurate surface profiling at the nanometer level presents significant challenges.

    Purpose of the Study:

    • To develop a one-dimensional stitching interferometry technique incorporating angular measurements.
    • To enhance the accuracy and reliability of nanometer-level mirror surface profiling.
    • To mitigate tilt errors introduced by stage motion during stitching.

    Main Methods:

    • Implementing a 1D stitching interferometry system.
    • Utilizing an auxiliary angular measurement device to quantify stage tilt errors.
    • Correcting local interferometric profiles with measured angles before piston adjustment.
    • Comparing the proposed method with classical software stitching techniques.

    Main Results:

    • The angle-measuring stitching technique demonstrates higher reliability and accuracy for mirror surface profiling.
    • Experimental validation confirms the feasibility of the proposed stitching method.
    • Achieved typical repeatability of 0.5 nm RMS or less within a 200 mm scanning range.

    Conclusions:

    • The developed 1D stitching interferometry based on angular measurement is a viable and effective technique for high-precision mirror metrology.
    • This method offers superior performance for nanometer-level surface profiling compared to conventional approaches.
    • The technique provides excellent repeatability, crucial for demanding optical applications.