Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

Band Theory02:35

Band Theory

17.3K
When two or more atoms come together to form a molecule, their atomic orbitals combine and molecular orbitals of distinct energies result. In a solid, there are a large number of atoms, and therefore a large number of atomic orbitals that may be combined into molecular orbitals. These groups of molecular orbitals are so closely placed together to form continuous regions of energies, known as the bands.
The energy difference between these bands is known as the band gap.
Conductor, Semiconductor,...
17.3K
Introduction and Methods of Leveling01:26

Introduction and Methods of Leveling

532
Leveling is a surveying procedure used to determine elevation differences between distant points. Elevation refers to the vertical distance above or below a reference datum, typically mean sea level (MSL). In the United States, elevations are often referenced to the mean sea level station at Father Point Rimouski along the St. Lawrence Seaway. To make the datum accessible, permanent markers are established throughout the region. These markers, called benchmarks, have known elevations. If the...
532
Methods of Documentation I: Source-Oriented Records01:18

Methods of Documentation I: Source-Oriented Records

1.7K
Source-oriented records, or SOR, are medical record-keeping organized by the data source. The SOR system was first developed in the mid-1900s to organize the growing patient data in hospitals and other healthcare facilities.
In an SOR, each discipline involved in patient care maintains a separate medical record section. This record-keeping method enables easy tracking of patient progress and ensures healthcare staff have access to up-to-date information.
Key Attributes include the following:
1.7K
Masking and Demasking Agents01:19

Masking and Demasking Agents

3.7K
EDTA titrations may necessitate masking and demasking agents to temporarily protect a particular metal ion in a mixture from the EDTA reaction. These agents facilitate the sequential analysis of the metal ions by forming stable complexes with some—but not all—metal ions during certain steps.
There are many masking agents, such as cyanide, fluoride, triethanolamine, thiourea, and 2,3-bis(sulfanyl)propan-1-ol (formerly 2,3-dimercapto-1-propanol), with the masking agent chosen based on...
3.7K
Administering Oxygen by Mask01:30

Administering Oxygen by Mask

2.6K
Administering Oxygen by Mask
Administering oxygen by mask is a common nursing intervention that provides supplemental oxygen to patients with respiratory distress or chronic lung conditions. This procedure involves delivering oxygen at a specified rate through a face mask connected to an oxygen source.
Equipment
The equipment necessary for this procedure includes:
2.6K
Distribution of Stresses in a Narrow Rectangular Beam01:11

Distribution of Stresses in a Narrow Rectangular Beam

546
In studying beam stress distribution, examining an elemental section is essential. To determine the average shearing stress on this face, the calculated shear is divided by the surface area. Importantly, shearing stresses on the beam's transverse and horizontal planes mirror each other, indicating a consistent stress distribution along the upper region of the beam. Notably, shearing stresses are absent at the beam's upper and lower surfaces due to the absence of applied forces in these...
546

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

Curvilinear Sub-Resolution Assist Feature Placement Through a Data-Driven U-Net Model.

Micromachines·2025
Same author

Enforcement of curvy MRC compliance with reduced complexity in inverse lithography.

Optics express·2025
Same author

Fast implicit active contour model for inverse lithography.

Optics express·2021
Same author

Semi-implicit level set formulation for lithographic source and mask optimization.

Optics express·2019
Same author

Efficient optical proximity correction based on semi-implicit additive operator splitting.

Optics express·2019
Same author

Level-set based mask synthesis with a vector imaging model.

Optics express·2017
Same journal

Denoising algorithm of Φ-OTDR systems based on adaptive fractional wavelet transform denoising.

Optics express·2026
Same journal

Millisecond photon-to-photon latency and high-speed volumetric projection system for optogenetics.

Optics express·2026
Same journal

Polarization-encoded coaxial structured light for high-precision 3D surface profilometry.

Optics express·2026
Same journal

Discrete freeform optical design based on collaborative optimization of point cloud and local normals.

Optics express·2026
Same journal

Ultrafast ghost imaging with 25 GHz speckle switching and wavelength-division multiplexing.

Optics express·2026
Same journal

Atomic vapor cells fabricated by femtosecond laser welding of standard-optical-quality glass.

Optics express·2026
See all related articles

Related Experiment Video

Updated: Feb 11, 2026

Detecting Pre-Stimulus Source-Level Effects on Object Perception with Magnetoencephalography
09:25

Detecting Pre-Stimulus Source-Level Effects on Object Perception with Magnetoencephalography

Published on: July 26, 2019

7.3K

Lithographic source and mask optimization with narrow-band level-set method.

Yijiang Shen

    Optics Express
    |May 3, 2018
    PubMed
    Summary
    This summary is machine-generated.

    This study introduces a novel narrow-band level-set method for source and mask optimization (SMO), enhancing wafer image printability for advanced semiconductor manufacturing. The new approach significantly improves computational efficiency and memory usage compared to traditional full-domain techniques.

    More Related Videos

    Visualization of Low-Level Gamma Radiation Sources Using a Low-Cost, High-Sensitivity, Omnidirectional Compton Camera
    06:28

    Visualization of Low-Level Gamma Radiation Sources Using a Low-Cost, High-Sensitivity, Omnidirectional Compton Camera

    Published on: January 30, 2020

    13.3K
    Testing Tactile Masking between the Forearms
    08:05

    Testing Tactile Masking between the Forearms

    Published on: February 10, 2016

    6.8K

    Related Experiment Videos

    Last Updated: Feb 11, 2026

    Detecting Pre-Stimulus Source-Level Effects on Object Perception with Magnetoencephalography
    09:25

    Detecting Pre-Stimulus Source-Level Effects on Object Perception with Magnetoencephalography

    Published on: July 26, 2019

    7.3K
    Visualization of Low-Level Gamma Radiation Sources Using a Low-Cost, High-Sensitivity, Omnidirectional Compton Camera
    06:28

    Visualization of Low-Level Gamma Radiation Sources Using a Low-Cost, High-Sensitivity, Omnidirectional Compton Camera

    Published on: January 30, 2020

    13.3K
    Testing Tactile Masking between the Forearms
    08:05

    Testing Tactile Masking between the Forearms

    Published on: February 10, 2016

    6.8K

    Area of Science:

    • Semiconductor Manufacturing
    • Computational Lithography
    • Image Processing

    Background:

    • Source and Mask Optimization (SMO) is critical for advanced semiconductor lithography (22nm and beyond).
    • Immersion lithography continuation relies on effective SMO techniques.
    • Existing SMO methods face computational and memory challenges.

    Purpose of the Study:

    • To reformulate Source and Mask Optimization (SMO) using a distance level-set method.
    • To enhance computational efficiency and numerical stability in SMO.
    • To reduce memory requirements and improve convergence in lithographic process modeling.

    Main Methods:

    • Developed a distance level-set regularized reformulation for SMO.
    • Implemented narrow-band computations to reduce computational load and memory usage.
    • Applied larger Euler time steps based on the Courant-Friedrichs-Lewy (CFL) condition.
    • Reduced optimization dimensionality for improved efficiency.

    Main Results:

    • Achieved stable curve evolution and accurate computations with a simpler numerical implementation.
    • Significantly eased computation load from convolution operations and memory requirements of the electric-field caching technique (EFCT).
    • Demonstrated improved convergence of the updating process.
    • Simulation results show enhanced computation efficiency, reduced memory usage, and better imaging performance.

    Conclusions:

    • The proposed narrow-band level-set based SMO offers a more efficient and stable approach.
    • This method effectively addresses computational bottlenecks in advanced lithography.
    • The technique improves overall imaging performance for critical semiconductor manufacturing nodes.