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Updated: Feb 11, 2026

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films
Published on: August 19, 2016
Interferometric profile measurement of optical-thickness by wavelength tuning with suppression of spatially uniform
Abstract:
Wavelength-tuning interferometry has been widely used for measuring the thickness variation of optical devices used in the semiconductor industry. However, in wavelength-tuning interferometry, the nonlinearity of phase shift causes a spatially uniform error in the calculated phase distribution. In this study, the spatially uniform error is formulated using Taylor series. A new 9-sample phase-shifting algorithm is proposed, with which the uniform spatial phase error can be eliminated. The characteristics of 9-sample algorithm is discussed using Fourier representation and RMS error analysis. Finally, optical-thickness variation of transparent plate is measured using the proposed algorithm and wavelength-tuning Fizeau interferometer and the error is compared with 7-sample algorithm.
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