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Published on: November 15, 2016
Engineering of III-Nitride Semiconductors on Low Temperature Co-fired Ceramics
J M Mánuel1,2, J J Jiménez3,4, F M Morales3,4
1IMEYMAT: Institute of Research on Electron Microscopy and Materials of the University of Cádiz, Cádiz, Spain. jose.manuel@uca.es.
Abstract:
This work presents results in the field of advanced substrate solutions in order to achieve high crystalline quality group-III nitrides based heterostructures for high frequency and power devices or for sensor applications. With that objective, Low Temperature Co-fired Ceramics has been used, as a non-crystalline substrate. Structures like these have never been developed before, and for economic reasons will represent a groundbreaking material in these fields of Electronic. In this sense, the report presents the characterization through various techniques of three series of specimens where GaN was deposited on this ceramic composite, using different buffer layers, and a singular metal-organic chemical vapor deposition related technique for low temperature deposition. Other single crystalline ceramic-based templates were also utilized as substrate materials, for comparison purposes.
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