Constructing a Multiple Covalent Interface and Isolating a Dispersed Structure in Silica/Rubber Nanocomposites with

Junchi Zheng, Dongli Han, Suhe Zhao

  • 1Beijing Red Avenue Innova Co., Ltd. , Unit 1, 2, 3, Building 10, No. 20 Kechuang Fourteenth Street, Beijing Economic-Technological Development Area (BDA) , Beijing 100176 , PR China.

Summary

A novel interface modifier, TSPD, enhances silica nanoparticle dispersion in rubber composites. The T&DMS-NR composite shows superior mechanical and dynamic properties due to improved nanoparticle dispersion, offering a new route to high-performance materials.

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