Reversible Oxidative Addition/Reductive Elimination of a Si-H Bond with Base-Stabilized Silylenes: A Theoretical

Masayuku Nakagaki1, Antoine Baceiredo2, Tsuyoshi Kato2

  • 1Fukui Institute for Fundamental Chemistry, Kyoto University, Takano-Nishi-hiraki-cho 34-4, Sakyo-ku, Kyoto, 606-8103, Japan.

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