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Accuracy optimization of combined multiparameter measuring systems with application to polarized light microscopy
Mykhailo Kuian1, Lothar Reichel1, Sergij V Shiyanovskii2
1Department of Mathematical Sciences, Kent State University, Kent, Ohio 44242, USA.
This study introduces a mathematical method to optimize control parameters in combined multiparameter measuring systems (CMPMSs), enhancing accuracy for various applications. The method effectively reduces inaccuracies in determined quantities, improving measurement reliability.
Area of Science:
- Metrology and Measurement Science
- Optical Physics
- Materials Science
Background:
- Combined multiparameter measuring systems (CMPMSs) determine multiple unknown quantities from single-variable measurements under varying control parameters.
- Inaccuracies in CMPMSs can arise from the selection of these control parameters.
- Optimizing control parameters is crucial for improving the accuracy of determined quantities.
Purpose of the Study:
- To develop a mathematical method for selecting optimal control parameters in CMPMSs.
- To minimize the upper bound of the error function for determined quantities.
- To enhance the accuracy and reliability of measurements in CMPMSs.
Main Methods:
- Utilizing the submultiplicativity of spectral and Frobenius matrix norms to construct an error function upper bound.
- Minimizing the derived upper bound to determine the optimal set of control parameters.
- Applying the method to the LC-PolScope technique for validating its effectiveness.
Main Results:
- A novel mathematical method for selecting optimal control parameters in CMPMSs was developed.
- The method successfully minimized the error bound, leading to improved accuracy.
- Application to the LC-PolScope demonstrated superior or comparable performance to existing parameter sets.
Conclusions:
- The proposed method offers a robust approach for optimizing control parameters in CMPMSs.
- This technique enhances measurement accuracy irrespective of specific system features or error distributions.
- The method is broadly applicable to various CMPMSs, including optical metrology applications.
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