Substrate Patterning Using Regular Macroporous Block Copolymer Monoliths as Sacrificial Templates and as Capillary...

Area of Science:

• Materials Science
• Nanotechnology
• Surface Chemistry

Background:

• Classical solid elastomer stamps have limitations in substrate patterning.
• Macroporous block copolymer monoliths offer advanced patterning capabilities.

Purpose of the Study:

• To utilize macroporous polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) monoliths for novel substrate patterning techniques.
• To demonstrate applications in creating patterned iridium films and microstamping for microscopy.

Main Methods:

• Fabrication of macroporous PS-b-P2VP monoliths using double replication of silicon molds.
• Employing monoliths as sacrificial templates for NaCl nanocrystal and iridium film deposition.
• Generating spongy-continuous mesopore systems for capillary microstamping.

Main Results:

• Ordered arrays of hexagonal iridium films with embedded NaCl nanocrystals were successfully created.
• Continuous ink films with precise hole patterns were microstamped onto glass slides using capillary action.
• The microstamping process was repeatable under ambient conditions without quality degradation.

Conclusions:

• Macroporous PS-b-P2VP monoliths provide a versatile platform for advanced surface patterning.
• These materials enable the fabrication of complex nanostructures and patterned films for various applications.
• The developed methods offer a robust and efficient approach for microscale patterning compatible with microscopy.