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Updated: Feb 7, 2026

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
Published on: January 19, 2020
Youjoung Kim1,2, Seth M Meade1,2, Keying Chen1,2
1Department of Biomedical Engineering, Case Western Reserve University, Cleveland, OH, United States.
Nano-architecture, a surface modification for intracortical microelectrodes (IME), enhances neural recording quality and implant longevity by mimicking native tissue. This approach improves biocompatibility and addresses IME failure for better neural interfaces.
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