Nucleobases adsorption studies on silicane layer: A first-principles investigation
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Published on: October 18, 2017
S Dharani1, V Nagarajan2, R Chandiramouli2
1School of Chemical & Biotechnology, SASTRA Deemed University, Tirumalaisamudram, Thanjavur, 613 401, India.
Abstract:
The geometric stability of silicane layer (H-Si) is explored using the first-principles investigation. The electronic properties of H-Si are ascertained, and tunable electronic properties of H-Si leads to the application in sequencing the deoxyribonucleic acid (DNA)/riboxy nucleic acid (RNA). The adsorption behavior of DNA/RNA nucleobases on H-Si is explored using Bader charge transfer, adsorption energy, and energy gap. Moreover, there is a significant change in the band structure and density of states of H-Si upon adsorption of nucleobases. We observed that all the nucleobases are physisorbed on H-Si via van der Waals interaction. The adsorption of nucleobases on H-Si is in the order G > C > A = T > U. The findings of the result demonstrate that H-Si can be used to identify the nucleobases, which can be used for DNA/RNA sequencing in medical science and biotechnology.
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