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Updated: Feb 7, 2026

Fabrication of Periodic Gold Nanocup Arrays Using Colloidal Lithography
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Patent Review on Laser Interference Lithography Technique for Producing Periodic Nanostructure.

Chia-Wei Jui1, Amy J C Trappey2, Chien-Chung Fu1

  • 1Institute of NanoEngineering and MicroSystems, National Tsing Hua University, Hsinchu City, Taiwan.

Recent Patents on Nanotechnology
|August 8, 2018
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Summary

Mask-less laser interference lithography (LIL) offers a cost-effective solution for semiconductor manufacturing. This technique is crucial for achieving high-precision nanoscale patterns, particularly in emerging bionanotechnology applications.

Keywords:
Laser interference lithographymasklessnanoscalenanostructurenanotechnologypatent reviewpatent searchperiodic.

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Area of Science:

  • Nanotechnology
  • Semiconductor Manufacturing
  • Optical Lithography

Background:

  • Semiconductor industry faces increasing cost pressures as feature sizes approach atomic scale.
  • Traditional lithography equipment is prohibitively expensive.
  • Mask-less Laser Interference Lithography (LIL) presents a cost-effective alternative.

Purpose of the Study:

  • To review patents related to Mask-less Laser Interference Lithography (LIL).
  • To analyze the technical features and configurations of LIL patents.
  • To identify trends in LIL technology development.

Main Methods:

  • Patent retrieval using keywords based on LIL technical features and experimental configurations.
  • Application of Boolean logic operators for patent set relationships.
  • Identification of common patent classification codes and definitions.

Main Results:

  • LIL patents are categorized into optical methods and lithographic equipment.
  • Beam splitter configurations dominate optical method patents.
  • System planning techniques are most prevalent in lithographic equipment patents.

Conclusions:

  • Improving LIL precision is vital to prevent defocusing for high-density line widths.
  • LIL is highly suitable for micro/nanofluidic devices in bionanotechnology.
  • The mask-less, periodic nanoscale pattern generation capability of LIL is valuable for periodicity-related fields.