Kinetics of deposition in the diffusion-controlled limit
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Updated: Feb 6, 2026

A Continuous-flow Photocatalytic Reactor for the Precisely Controlled Deposition of Metallic Nanoparticles
Published on: April 10, 2019
1Department of Physics, Boston University, Boston, Massachusetts 02215, USA.
Abstract:
The adsorption of particles diffusing in a half space bounded by the substrate and irreversibly sticking to the substrate upon contacts is investigated. We show that when absorbing particles are planar disks diffusing in the three-dimensional half space, the coverage approaches its saturated "jamming" value as t^{-1} in the large time limit (generally as t^{-1/(d-1)} when the substrate is d dimensional and d>1, and as e^{-t/ln(t)} when d=1). We also analyze the asymptotic behavior when particles are spherical and when particles are planar aligned squares.
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