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    This study demonstrates a compact silicon photonic phase modulator using epsilon-near-zero transparent conducting oxide films. Cadmium oxide (CdO) TCOs enable practical phase modulation with a high figure of merit, paving the way for miniaturized photonic devices.

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    Area of Science:

    • Photonics
    • Materials Science
    • Electrical Engineering

    Background:

    • Silicon photonics offers miniaturization potential for optical devices.
    • Transparent conducting oxides (TCOs) are crucial for modulating light signals.
    • Epsilon-near-zero (ENZ) materials exhibit unique optical properties for device applications.

    Purpose of the Study:

    • To analyze a compact silicon photonic phase modulator utilizing ENZ TCO films at 1.55 μm.
    • To compare the performance of indium oxide (In2O3) and cadmium oxide (CdO) TCOs in phase modulation.
    • To identify high-mobility ENZ materials for enhanced phase modulator performance.

    Main Methods:

    • Fabrication of a non-resonant phase modulator using a CMOS-compatible process.
    • Deposition of thin TCO films (In2O3 and CdO) on a silicon waveguide.
    • Analysis of phase modulation performance based on field-effect carrier density modulation.

    Main Results:

    • Practical phase modulation was achieved only with high-mobility ENZ materials like CdO.
    • The CdO-based phase modulator demonstrated a figure of merit of 17.1°/dB.
    • The device achieved modulation in a compact 5 μm length.

    Conclusions:

    • High-mobility TCOs are essential for efficient silicon photonic phase modulation.
    • CdO TCOs provide a promising material for compact and high-performance phase modulators.
    • Further optimization with suitable TCOs can lead to device miniaturization and improved phase shifts.