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Corrugated Heterojunction Metal-Oxide Thin-Film Transistors with High Electron Mobility via Vertical Interface

Minuk Lee1, Jeong-Wan Jo1, Yoon-Jeong Kim1

  • 1School of Electrical and Electronic Engineering, Chung-Ang University, Seoul, 06974, Korea.

Advanced Materials (Deerfield Beach, Fla.)
|August 29, 2018
PubMed

Keywords:
TCAD simulationscorrugated structuresheterointerfacesmetal-oxide thin-film transistorssolution processes

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