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The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
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Hydride oxidation from a titanium-aluminum bimetallic complex: insertion, thermal and electrochemical reactivity

Alexandra C Brown1, Alison B Altman1,2, Trevor D Lohrey1,2

  • 1Department of Chemistry , University of California , Berkeley , California 94720 , USA .

Chemical Science
|August 30, 2018
PubMed

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