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Updated: Feb 6, 2026

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Self-Templating Approaches to Hollow Nanostructures.

Ji Feng1, Yadong Yin1

  • 1Department of Chemistry, University of California, Riverside, CA, 92521, USA.

Advanced Materials (Deerfield Beach, Fla.)
|August 30, 2018
PubMed
Summary

This review covers hollow nanostructures fabrication using self-templating methods. Key strategies like galvanic replacement and Kirkendall effect are detailed, offering insights into future research directions.

Keywords:
Ostwald ripeningdissolution-regrowthgalvanic replacementshollow nanostructuresself-templatingsurface-protected hollowing processthe Kirkendall effect

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Area of Science:

  • Materials Science
  • Nanotechnology

Background:

  • Hollow nanostructures possess unique properties and diverse applications.
  • Fabrication of these structures is crucial for advancing nanotechnology.

Purpose of the Study:

  • To review the progress in fabricating hollow nanostructures.
  • To focus on self-templating fabrication methods.

Main Methods:

  • Review of established self-templating strategies: galvanic replacement, Kirkendall effect, Ostwald ripening, dissolution-regrowth, and surface-protected hollowing.
  • Discussion of newly developed synthetic routes.

Main Results:

  • Comprehensive overview of five primary self-templating methods for hollow nanostructure synthesis.
  • Highlighting of innovative and recently developed fabrication techniques.

Conclusions:

  • Summary of current advancements in self-templating fabrication of hollow nanostructures.
  • Perspectives on future research directions and potential breakthroughs in the field.