Development and characterization of a helicon plasma source

The Helicon Plasma Source (HeliPS) designed and developed at the Centre of Plasma Physics-Institute for Plasma Research is a versatile helicon plasma device, which operates in a wide range of magnetic field configurations from 50 G to 500 G. This device is dedicated to perform a broad range of research activities. The main objective for development of the HeliPS is to carry out studies on ion-ion plasmas in electronegative gases. In the near future, ion-ion plasmas will be formed in electronegative gases in the downstream of the plasma production region. Although the system is primarily designed to carry out ion-ion plasma experiments, the same system can also be used for experimental studies on some basic helicon plasma properties such as wave propagation, wave coupling, and plasma instability. At present, argon plasma is produced with a RF power supply of 13.56 MHz frequency. External circuit parameters, such as antenna current, plasma resistance (R_p), and internal parameters, such as electron density and temperature, are measured. The details of the experimental setup development, device characteristic, as well as preliminary plasma production and characterization to confirm occurrence of the helicon plasma in the system are presented in this article.