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    Area of Science:

    • Optical Metrology
    • Precision Engineering
    • Surface Metrology

    Background:

    • Stitching interferometry is crucial for measuring large optical surfaces that exceed the aperture of a single interferogram.
    • Accurate surface characterization requires precise compensation for tip/tilt errors during measurement.

    Purpose of the Study:

    • To propose and validate a two-dimensional stitching interferometry system utilizing two tiltmeters.
    • To demonstrate the system's capability in correcting surface tip/tilt and generating a high-resolution stitching surface map.
    • To evaluate the system's repeatability and compare its performance against existing methods.

    Main Methods:

    • A novel system employs two tiltmeters: one stationary with the interferometer, the other on the translation stage with the surface under test.
    • Relative tilt differences in x- and y-directions are recorded to correct for surface tip/tilt in each measurement subset.
    • Piston adjustment is performed post-correction to generate the final stitched surface map.

    Main Results:

    • A stitching result for a 125mm-long mirror surface is presented as a practical demonstration.
    • The developed stitching system exhibits a high repeatability of approximately 1.48 nm RMS.
    • Comparative analysis with a one-dimensional angular-measurement-based stitching method highlights the proposed system's advantages and limitations.

    Conclusions:

    • The proposed two-dimensional stitching interferometry system effectively corrects for surface tip/tilt using dual tiltmeter measurements.
    • The system demonstrates high precision and repeatability, suitable for advanced optical metrology applications.
    • This method offers a valuable alternative for high-accuracy surface mapping, particularly for large optics.