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Updated: Feb 5, 2026

Characterizing Far-infrared Laser Emissions and the Measurement of Their Frequencies
Published on: December 18, 2015
X-RAY EMISSION FROM MATERIALS PROCESSING LASERS
R Behrens1, B Pullner1, M Reginatto1
1Physikalisch-Technische Bundesanstalt, Bundesallee 100, D-38116 Braunschweig, Germany.
Abstract:
The emission of laser induced X-rays from materials processing ultra-short pulsed laser systems was measured. The absolute spectral photon fluence was determined using a thermoluminescence detector based few-channel spectrometer. The spectra at 10 cm from the laser focus were in the energy region between 2 and 25 keV with mean energies of ~4-6 keV (when weighted by fluence or directional dose equivalent) and up to 13 keV (when weighted by ambient dose equivalent). The operational quantities, H·'(0.07), H·'(3) and H·*(10), were determined to be in the order of 1600-7300, 16-71 and 1-4 mSv per hour processing time, respectively, depending on the material and condition of the workpiece. The dose contribution due to photons above 30 keV was for all quantities negligible, i.e. below 10-3.
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