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Characterizing Far-infrared Laser Emissions and the Measurement of Their Frequencies
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X-RAY EMISSION FROM MATERIALS PROCESSING LASERS.

R Behrens1, B Pullner1, M Reginatto1

  • 1Physikalisch-Technische Bundesanstalt, Bundesallee 100, D-38116 Braunschweig, Germany.

Radiation Protection Dosimetry
|September 15, 2018
PubMed
Summary
This summary is machine-generated.

This study measured X-ray emissions from ultra-short pulsed laser systems used in materials processing. Dosimetry results indicate potential radiation exposure levels requiring careful consideration during operation.

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Area of Science:

  • Physics
  • Materials Science
  • Radiation Safety

Background:

  • Materials processing with ultra-short pulsed lasers can generate X-ray emissions.
  • Understanding these emissions is crucial for radiation safety and system design.

Purpose of the Study:

  • To quantify the spectral photon fluence and dose rates of laser-induced X-rays.
  • To assess the operational dose quantities for materials processing applications.

Main Methods:

  • Utilized a thermoluminescence detector-based few-channel spectrometer to measure absolute spectral photon fluence.
  • Determined X-ray spectra and operational quantities (H·'(0.07), H·'(3), H·*(10)) at 10 cm from the laser focus.

Main Results:

  • X-ray spectra ranged from 2 to 25 keV, with mean energies of ~4-6 keV (fluence/directional dose equivalent) and up to 13 keV (ambient dose equivalent).
  • Operational quantities H·'(0.07), H·'(3), and H·*(10) were measured at 1600-7300, 16-71, and 1-4 mSv/hour, respectively.
  • Dose contribution from photons above 30 keV was negligible (<10-3).

Conclusions:

  • Laser-induced X-ray emissions from materials processing systems are measurable and characterized.
  • The determined dose rates highlight the need for appropriate radiation protection measures.
  • The study provides essential data for risk assessment in laser-based material processing.