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Out-of-Band Radiation and Spatio-Temporal Characterization of Gd Target Laser Plasma Sources
Guang Pu Xue Yu Guang Pu Fen Xi = Guang Pu
|September 18, 2018
Summary
Using a Gadolinium-doped glass target significantly reduces out-of-band radiation from extreme ultraviolet sources. This study analyzes plasma properties, finding optimal conditions for reduced OOB emissions.
Area of Science:
- Laser-induced plasma physics
- Extreme ultraviolet (EUV) source development
- Materials science for plasma targets
Context:
- Extreme ultraviolet (EUV) sources are crucial for advanced lithography.
- Out-of-band (OOB) radiation is a significant challenge in EUV source efficiency and performance.
- Gadolinium (Gd) targets are investigated for plasma generation and OOB radiation mitigation.
Purpose:
- To comparatively study the out-of-band (OOB) radiation from Nd:YAG laser ablation of Gd metal and Gd-doped glass targets.
- To analyze the spectral distribution and blackbody-like continuum emission of the plasma.
- To investigate the temporal and spatial characteristics of electron temperature (Te) and density (Ne) in Gd-doped glass target plasma.
Summary:
- Nd:YAG laser ablation of Gd targets generated plasma, with continuous radiation identified as the main OOB component, matching blackbody radiation at ~5 eV.
- Gd-doped glass targets considerably decreased OOB radiation intensity compared to Gd metal targets.
- Optical Emission Spectroscopy revealed exponential decay of Te and Ne over time and a peak in both parameters at ~6 mm from the target surface.
Impact:
- Demonstrates Gd-doped glass as an effective target material for reducing OOB radiation in EUV sources.
- Provides detailed characterization of plasma parameters (Te, Ne) relevant to EUV source design.
- Offers insights into optimizing target configurations for improved EUV source efficiency and spectral purity.
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