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Published on: May 24, 2020
High-Performance Thin Film Transistor with an Neodymium-Doped Indium Zinc Oxide/Al₂O₃ Nanolaminate Structure
Rihui Yao1, Xiaoqing Li2, Zeke Zheng3,4
1Institute of Polymer Optoelectronic Materials and Devices, State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou 510640, China. yaorihui@scut.edu.cn.
Abstract:
In this work, a high-performance thin film transistor with an neodymium-doped indium zinc oxide (Nd:IZO) semiconductor via a room temperature approach and adopting the Nd:IZO/Al₂O₃ nanolaminate structure was investigated. The effects of the ultrathin Al₂O₃ layer and the thickness of Nd:IZO layer in the nanolaminate structure on the improvement of electrical performance and stability of thin film transistors (TFTs) were systematically studied. Besides the carrier movement confined along the near-channel region, driven by the Al₂O₃ layer under an electrical field, the high performance of the TFT is also attributed to the high quality of the 8-nm-thick Nd:IZO layer and the corresponding optimal Nd:IZO/Al₂O₃ interface, which reduce the scattering effect and charge trapping with strong M⁻O bonds in bulk and the back-channel surface of Nd:IZO, according to the X-ray reflectivity (XRR), X-ray photoelectron spectroscopy (XPS), and micro-wave photo conductivity decay (μ-PCD) results. As a result, the Nd:IZO/Al₂O₃ TFT exhibits an outstanding performance, with a high μsat of 32.7 cm²·V-1·s-1, an Ion/Ioff of 1.9 × 10⁸, and a low subthreshold swing (SS) value of 0.33 V·dec-1, which shows great potential for the room temperature fabrication of TFTs in high-resolution or high-frame-rate displays by a scalable, simple, and feasible approach.
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