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Updated: Feb 4, 2026

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Structural properties of silicon-germanium and germanium-silicon core-shell nanowires
Conn O'Rourke1, Shereif Y Mujahed, Chathurangi Kumarasinghe
1London Centre for Nanotechnology, University College London, 17-19 Gordon St, London, WC1H 0AH, United Kingdom. International Centre for Materials Nanoarchitectonics (MANA), National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan.
Abstract:
Core-shell nanowires made of Si and Ge can be grown experimentally with excellent control for different sizes of both core and shell. We have studied the structural properties of Si/Ge and Ge/Si core-shell nanowires aligned along the [Formula: see text] direction, with diameters up to 10.2 nm and varying core to shell ratios, using linear scaling density functional theory. We show that Vegard's law, which is often used to predict the axial lattice constant, can lead to an error of up to 1%, underlining the need for a detailed ab initio atomistic treatment of the nanowire structure. We analyse the character of the intrinsic strain distribution and show that, regardless of the composition or bond direction, the Si core or shell always expands. In contrast, the strain patterns in the Ge shell or core are highly sensitive to the location, composition and bond direction. The highest strains are found at heterojunction interfaces and the surfaces of the nanowires. This detailed understanding of the atomistic structure and strain paves the way for studies of the electronic properties of core-shell nanowires and investigations of doping and structure defects.
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