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Updated: Feb 4, 2026

Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
Fabrication of buried nanostructures by atomic layer deposition
Rizwan Ali1, Muhammad Rizwan Saleem2,3, Matthieu Roussey2
1Institute of Photonics, University of Eastern Finland, Joensuu, P.O. Box 111, FI-80101, Finland. rizwan.ali@uef.fi.
Abstract:
We present a method for fabricating buried nanostructures by growing a dielectric cover layer on a corrugated surface profile by atomic layer deposition of TiO2. Selecting appropriate process parameters, the conformal growth of TiO2 results in a smooth, nearly flat-top surface of the structure. Such a hard surface can be easily cleaned without damage, making the nanostructure reusable after contamination. The technique has wide applicability in resonance-domain diffractive optics and in realization of quasi-planar metamaterials. We discuss design issues of such optical elements and demonstrate the method by fabricating narrow-band spectral filters based on the guided-mode resonance effect. These elements have strong potential for, e.g., sensing applications in harsh conditions.
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