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High-stress W/Si multilayers are crucial for the X-ray Timing and Polarimetry telescope. Optimizing d-spacing and thickness ratios minimizes stress while maintaining layer structure for improved mirror performance.

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Area of Science:

  • Materials Science
  • Astrophysics
  • High-Energy Physics

Background:

  • The X-ray Timing and Polarimetry (XTP) telescope requires high-performance optics for high-energy physics studies (1-30 keV).
  • Tungsten/Silicon (W/Si) multilayers are essential for achieving high reflectance and low stress in the telescope's focusing optics.
  • Maintaining mirror figure quality and improving spectral response depend on the precise properties of these multilayers.

Purpose of the Study:

  • To investigate the stress and layer structure of W/Si periodic multilayers.
  • To analyze the impact of varying d-spacings, thickness ratios, and bilayer numbers on multilayer properties.
  • To optimize W/Si multilayer design for the XTP telescope's mirror requirements.

Main Methods:

  • Fabrication of W/Si multilayers with controlled d-spacings, thickness ratios, and bilayer numbers.
  • Characterization of stress and average interface width using profilometry and X-ray reflectivity.
  • X-ray diffraction (XRD) measurements to analyze crystallization and phase changes.
  • Surface morphology analysis using atomic force microscopy (AFM) to determine root-mean-square roughness.

Main Results:

  • Increased d-spacing from 2.7 to 5.5 nm significantly raised multilayer stress from -73.3 to -465.5 MPa, with minimal change in interface width (0.31-0.36 nm).
  • The lowest stress for W/Si multilayers (at d=3.7 nm) occurred at a W thickness ratio of ~0.46, without affecting interface width.
  • Bilayer number (80-160) had negligible impact on stress and structure; multilayers exhibited smooth surfaces (RMS roughness ~0.19 nm).
  • XRD revealed increased crystallization and phase changes in thicker W layers, correlating with higher compressive stress.

Conclusions:

  • W/Si multilayer stress is highly sensitive to d-spacing and W layer thickness.
  • Optimizing the W/Si multilayer structure, particularly the thickness ratio, is critical for minimizing stress while maintaining optical performance for the XTP telescope.
  • Understanding microstructural changes through XRD is key to controlling stress and improving mirror quality for high-energy astrophysics applications.