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Angular and Spectral Bandwidth of Extreme UV Multilayers Near Spacer Material Absorption Edges.

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Switching to a Free Electron Laser (FEL) EUV source impacts multilayer optics. Angular bandwidth increases near absorption edges, contrary to spectral bandwidth, due to changing optical constants.

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Area of Science:

  • Optics and Photonics
  • Materials Science
  • Semiconductor Manufacturing

Background:

  • High-resolution imaging in the extreme ultraviolet (EUV) range relies on multilayer optics.
  • Current EUV lithography uses broadband sources, necessitating broadband mirrors.
  • Free Electron Lasers (FELs) offer bright, narrowband EUV light at tunable wavelengths, enabling different mirror design considerations.

Purpose of the Study:

  • To investigate the impact of switching to an FEL EUV source on multilayer mirror performance.
  • To analyze the behavior of angular bandwidth in multilayer systems near material absorption edges.
  • To determine the relationship between spectral and angular bandwidths for various multilayer combinations.

Main Methods:

  • Theoretical analysis of multilayer optical constants and bandwidths.
  • Modeling of Mo/Si, Mo/Be, Ru/Si, Ru/B, and La/B multilayer systems.
  • Experimental verification of angular bandwidth for Mo/Si multilayers at specific EUV wavelengths.

Main Results:

  • Angular bandwidth increases near spacer absorption edges for several multilayer systems (Mo/Si, Mo/Be, Ru/Si, Ru/B, La/B).
  • This behavior is opposite to the spectral bandwidth, which drops near absorption edges.
  • The observed effect is attributed to the interplay of changing optical constants of constituent materials.
  • Experimental data for Mo/Si multilayers at 13.5 nm and 12.6 nm confirm the calculated angular bandwidth trends.

Conclusions:

  • The assumption of correlated spectral and angular bandwidths in multilayer optics is challenged when using FEL sources.
  • Understanding the independent behavior of angular bandwidth is crucial for designing large-aperture, diffraction-limited EUV optical systems.
  • The findings provide valuable insights for optimizing multilayer mirror performance with tunable narrowband EUV sources.